Puas yog electrolytic polishing haum rau cov txheej txheem sab hauv?

Ib, Lub tswv yim tseem ceeb tom qab electrolytic polishing yog cov cuab yeej qib uas tsis kov dab tsi.
Anodic dissolution yog dab tsi ua rau electrolytic polishing ua haujlwm. Tus yuam sij rau nws txoj kev vam meej yog qhov sib txawv ntawm kev faib tawm tam sim no. Raws li anode, lub workpiece yog submerged hauv electrolyte. Lub micro protrusions nyob rau saum npoo yaj ua ntej vim qhov ceev tam sim no siab dua, thaum cov kev nyuaj siab yaj ntau dua vim qhov ceev tam sim no qis dua. "Kev xav ntawm mucosal" yog lub tswv yim tseem ceeb tom qab cov txheej txheem no. Nws hais tias phosphate ions nyob rau hauv cov electrolyte tsim ib tug tuab phosphate zaj duab xis nrog yaj hlau ions. Cov zaj duab xis yog thinner ntawm cov protrusions thiab dissolves sai dua, thiab nws yog thicker nyob rau hauv kev nyuaj siab thiab dissolves qeeb qeeb. Lub zog txav ntawm cov mucosa ua kom qib tawm ntawm micro roughness ntawm qhov chaw, uas nws thiaj li ua rau nws du zoo li daim iav.
Piv txwv li, sab hauv mesh qauv ntawm 316L stainless hlau hlab plawv stent tsuas yog 0.1 hli dav, thiab tsoos mechanical polishing tuaj yeem yooj yim ua rau lub mesh tawg lossis distort. Electrolytic polishing tuaj yeem ua rau saum npoo ntawm sab hauv mesh tsis ntxhib los ntawm kev tswj qhov ceev tam sim no (15-50A / dm²) thiab electrolyte kub (60-70 degree) ua tib zoo. Nws tuaj yeem txo qhov roughness ntawm Ra3.2 μm rau Ra0.05 μm lossis qis dua yam tsis hloov qhov loj ntawm stent. Nws kuj tau tshem tawm cov kev ntxhov siab uas seem uas tau tshwm sim los ntawm kev siv tshuab, uas ua rau lub stent kav ntev dua thiab sib haum nrog lub cev.
2, Peb lub ntsiab kev siv thev naus laus zis ntawm kev ua cov txheej txheem nyuaj sab hauv
1. Kev pabcuam thoob ntiaj teb tsis muaj qhov khoob
Electrolytic polishing tuaj yeem ua haujlwm hauv qhov chaw uas tsis muaj chaw txaus vim nws tsis kov dab tsi. Lub plasma etching cov tshuaj tiv thaiv chamber siv nyob rau hauv lub semiconductor kev lag luam muaj kaum tawm txhiab tus micropores uas yog 0.5mm nyob rau hauv txoj kab uas hla thiab ntev raws uas muaj txog li 500 hli ntev. Txhawm rau ua cov tshuab polishing ib txwm muaj, koj yuav tsum sib cais cov kab noj hniav thiab siv cov cuab yeej tshwj xeeb los ua haujlwm ntawm txhua qhov. Qhov no yuav siv sij hawm ntau heev thiab yooj yim kom qias neeg. Nrog lub tshuab electrolyte circulating, electrolytic polishing tuaj yeem ua tiav. Qhov no cia tam sim no sib npaug mus txog txhua qhov chaw microstructure thiab txhuam lawv txhua lub sijhawm. Lub chaw tsim khoom ntawm cov khoom siv semiconductor tau muab cov ntaub ntawv siv tau qhia tias electrolytic polishing tuaj yeem txo qhov roughness hauv cov tshuaj tiv thaiv chamber los ntawm Ra1.6 μm rau Ra0.02 μm. Nws kuj tseem tuaj yeem txo cov hlau me me kom tsawg dua 5 ib square centimeter, uas ua tau raws li cov qauv kev huv huv rau 5nm txheej txheem chips.
2. Txhim kho microscopic tsis xws luag thiab ua kom cov khoom ua haujlwm zoo dua
Thaum lub sij hawm tsim cov txheej txheem, complex tha xim sab hauv tej zaum yuav muaj teeb meem xws li microcracks thiab porosity. Electrolytic polishing tuaj yeem nyiam tshem tawm cov ntaub ntawv los ntawm cov cheeb tsam tsis zoo los ntawm kev xaiv cov txheej txheem tawg. Piv txwv li, titanium alloy aviation fasteners tseem muaj micro qhov ntawm 0.01-0.05mm hauv cov xov sab hauv tom qab kub isostatic nias (HIP) kho. Electrolytic polishing ua rau saum npoo ntawm cov xov smoother thaum kho qhov ceev tam sim no (20-30A / dm ²) kom yaj cov khoom ntawm cov npoo ntawm micropores, uas pab kaw qhov pores. Tom qab ua tiav, cov fasteners lub zog qaug zog nce los ntawm 35%, thiab lawv cov corrosion kuj tau ntsib ASTM G48 tus qauv qib A.
3. Pab pawg ua haujlwm thiab txiav cov nqi
Electrolytic polishing yog ib txoj hauv kev zoo dua rau polishing ntau ntawm cov khoom nyuaj. Piv txwv li, cov roj injector nyob rau hauv lub tsheb cov roj txhaj tshuaj muaj kaum ob ntawm 0.2mm txoj kab uas hla ntawm qhov txhaj tshuaj thiab txoj kev nyuaj ntws sab hauv. Nws yuav siv sij hawm ntau tshaj 2 teev los txhuam ib daim hlau uas siv cov cuab yeej siv tshuab polishing, thiab nws yuav tsum tau clamped thiab positioned ob peb zaug. Electrolytic polishing siv cov cuab yeej tshwj xeeb thiab tuaj yeem txhuam 50 mus rau 100 roj av injectors ib zaug. Qhov no txiav lub sijhawm ua haujlwm rau ib yam khoom mus rau 8 feeb thiab ua kom lub ntsej muag roughness zoo ib yam txhua lub sijhawm, tsis zoo li cov tshuab polishing. Raws li cov ntaub ntawv los ntawm ib lub tuam txhab uas ua rau lub tsheb qhov chaw, electrolytic polishing tau nce tus nqi ntawm cov roj injectors los ntawm 82% mus rau 98%, uas txuag lub tuam txhab ntau tshaj 2 lab yuan ib xyoo nyob rau hauv rework nqi.
3, Piv txwv thiab cov ntaub ntawv los ntawm kev lag luam uas txhawb nqa
1. Cov khoom siv kho mob: ua rau orthopedic implants ntau biocompatible
Cov qauv porosity sab hauv ntawm cov khoom siv dag zog sib koom ua ke yuav tsum ua kom tiav qhov kev loj hlob ntawm osteocytes thaum inhibiting kab mob adhesion. Los ntawm ua tib zoo kho tus nqi ntawm phosphoric acid thiab sulfuric acid nyob rau hauv cov khoom sib xyaw electrolyte (65-75% phosphoric acid thiab 10-15% sulfuric acid), electrolytic polishing tuaj yeem ua rau cov zaj duab xis passivation uas tuab tuab ntawm qhov ntxeem tau. Kev sim cov ntaub ntawv los ntawm lub tuam txhab kho mob ntau lub teb chaws qhia tau hais tias electrolytic polishing ua rau titanium alloy hip ob leeg prostheses smoother, nrog rau sab hauv pores mus ntawm Ra2.5 μ m rau Ra0.3 μ m, 92% txo cov kab mob adhesion, thiab txo qis hauv cov kab mob tom qab los ntawm 1.2% mus rau 0.15%.
2. Aerospace teb: Txhim kho cov cua kub tsis kam ntawm turbine hniav
Cov cua txias sab hauv txoj kab uas hla ntawm lub dav hlau cav turbine hniav tsuas yog 0.8 hli, thiab cov khoom siv tshuab polishing tuaj yeem hloov pauv cov duab ntawm cov channel, uas ua rau cov cua txias tsis zoo. Electrolytic polishing siv cov tshuab mem tes tam sim no (30% lub voj voog ua haujlwm, zaus 1kHz) ua kom lub ntsej muag smoother yam tsis muaj qhov loj ntawm cov channel. Nws tuaj yeem mus ntawm Ra1.6 μm rau Ra0.1 μ m. Ib qho kev sim ua los ntawm qee lub tshuab tsim lub dav hlau tau qhia tias cov cua kub hloov pauv ntawm cov hniav kho cov cua txias sab hauv tau nce 18% ntawm qhov kub ntawm 1200 degree. Lub cav tag nrho efficiency tau nce 2.3%.
4, Cov teeb meem thiab kev daws teeb meem hauv Technology
Electrolytic polishing muaj ntau yam txiaj ntsig thaum nws los ua haujlwm nrog cov txheej txheem sab hauv nyuaj, tab sis nws tseem muaj ob qhov teeb meem loj los daws:
Tswj qhov sib xws ntawm electrolyte: Cov qauv zoo li qhov qhov muag tsis pom kev sib sib zog nqus yuav ua rau cov electrolyte ntws tsis zoo, uas tuaj yeem ua rau muaj qhov sib txawv ntawm cov concentration hauv ntau qhov chaw. Cov lus teb yog siv ultrasonic-pab nplawm, ua kom cov kab ke sib txawv, thiab ua cov electrolytes tshiab uas tsis muaj viscosity thiab siab conductivity (piv txwv li, ntxiv ethylene glycol los ua kom cov kua dej ntws zoo dua).
Kev tswj xyuas qhov ceev tam sim no: Cov duab ntawm lub workpiece tuaj yeem hloov pauv qhov ceev tam sim no ntawm cov qauv ntawm qib micrometer. Los ntawm kev ua tus qauv ntxaib digital thiab siv finite element tsom xam (FEA) simulate tam sim no kev faib tawm, cathode tsim (xws li siv 3D luam ntawv zoo li cathodes) thiab cov txheej txheem tsis (xws li siv gradient tam sim no ntom ntom technology) tuaj yeem txhim kho kom tau txais txawm polishing ntawm cov qauv nyuaj.